完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tien, CH | en_US |
dc.contributor.author | Lee, CH | en_US |
dc.date.accessioned | 2014-12-08T15:17:31Z | - |
dc.date.available | 2014-12-08T15:17:31Z | - |
dc.date.issued | 2006-02-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.45.1015 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/12694 | - |
dc.description.abstract | Optical micromachining or microelectromechanical systems (MEMS) typically require etch holes to reduce the time required to release the micromechanical structure during the sacrificial undercutting. However, high-order diffraction beams generated by the periodic etch-hole array often deteriorate the optical performance by generating noise and erroneous crosstalk signals in. most optical systems. In this study, we examined the diffraction from a perforated micromirror and proposed a random distributed etch-hole layout. Due to the superposition of cosine functions with random periods, noise caused by high-order beams can be averaged effectively. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | MEMS | en_US |
dc.subject | etch holes | en_US |
dc.subject | diffraction | en_US |
dc.title | Optical properties of surface micromachining with randomly distributed etch holes | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.45.1015 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | en_US |
dc.citation.volume | 45 | en_US |
dc.citation.issue | 2A | en_US |
dc.citation.spage | 1015 | en_US |
dc.citation.epage | 1017 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | 顯示科技研究所 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.contributor.department | Institute of Display | en_US |
dc.identifier.wosnumber | WOS:000235692100080 | - |
dc.citation.woscount | 1 | - |
顯示於類別: | 期刊論文 |