标题: | Development of an artificial neural network to predict lead frame dimensions in an etching process |
作者: | Liu, TC Li, RK Chen, MC 工业工程与管理学系 Department of Industrial Engineering and Management |
关键字: | artificial neural network;lead frame;photo-etching |
公开日期: | 1-二月-2006 |
摘要: | The electronic industry is rapidly developing, creating high demand for IC production. Etched semiconductor lead frames are the basic material used in IC packaging. IC packaging requires high-precision lead frames. The dimensions of the pilot hole are generally required to be highly precise in lead frame manufacturing. The photo-etching process must control the dimension of the pilot hole and record the manufacturing data of the etching machine and inspection data. This study presents the development of an artificial neural network (ANN) model that can be applied to construct the predicting model. The predictive model can estimate the dimensions of the pilot hole and thus determine the process parameters needed to improve lead frame quality in the etching process. |
URI: | http://dx.doi.org/10.1007/s00170-004-2310-5 http://hdl.handle.net/11536/12702 |
ISSN: | 0268-3768 |
DOI: | 10.1007/s00170-004-2310-5 |
期刊: | INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY |
Volume: | 27 |
Issue: | 11-12 |
起始页: | 1211 |
结束页: | 1216 |
显示于类别: | Articles |
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