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dc.contributor.authorShi, SCen_US
dc.contributor.authorChattopadhyay, Sen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorChen, LCen_US
dc.date.accessioned2014-12-08T15:17:32Z-
dc.date.available2014-12-08T15:17:32Z-
dc.date.issued2006-01-25en_US
dc.identifier.issn0009-2614en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.cplett.2005.10.107en_US
dc.identifier.urihttp://hdl.handle.net/11536/12715-
dc.description.abstractAluminum nitride (AIN) nanostructures were prepared using thermal chemical vapour deposition process. At growth temperatures of 950 degrees C, AIN nanotips with apex diameters of 10 nm, base diameters of similar to 100 nm, and length of similar to 2000 nm were obtained. Whereas when the growth temperature was 1200 degrees C, we obtained shorter and ihicker AIN nanorods. Compelling microscopic evidences were obtained to show that stacked AIN platelets of diminishing size formed the building blocks for the nanotips. A reducing Ehrlich-Schwoebel barrier introduced into a diffusion mediated growth model explains the formation of AIN nanorods at increasing growth temperatures. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleStructural evolution of AlN nano-structures: Nanotips and nanorodsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.cplett.2005.10.107en_US
dc.identifier.journalCHEMICAL PHYSICS LETTERSen_US
dc.citation.volume418en_US
dc.citation.issue1-3en_US
dc.citation.spage152en_US
dc.citation.epage157en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000234849500030-
dc.citation.woscount26-
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