高壓逆滲透膜組應用在Cu-CMP製程排水回收之研究

Abstract

本研究對象的晶圓半導體廠，擬用新款高壓逆滲透薄膜搭配新的製程處理系統，將夏季以外時節所浪費的含銅研磨回收水再利用，藉由改變產水及濃縮水比例的調配以及運轉壓力，檢測產水總有機碳濃度來決定最適合系統操作的參數，藉此將含銅研磨回收水再利用至一級用水，使水資源利用最大化。 實驗結果顯示，新設計的迴流製程(第一段RO逆滲透產水，而第二段RO逆滲透產水迴流) 搭配新款高壓逆滲透薄膜，可以控制總有機碳濃度低於純水系統的水質需求(< 2.5 mg/L)；而且各方面系統的操作參數設定 (產水及濃縮水量比例、操作壓力)，對於RO逆滲透單元的運轉可以維持穩定的水質，並且不會發生逆滲透薄膜堵塞或者損壞的情形。 含銅研磨回收水經過處理後，將之導入純水系統使用，依照每日冷卻水塔使用量計算，每日可以減少100噸的自來水消耗，且對於純水系統的各單元水質無明顯差異，是以判斷逆滲透薄膜系統運作穩定，則可以每年減少約170,000噸的自來水消耗，累積的節水量相當於5%的寶二水庫蓄水量。

The study intends to use the new high-pressure reverse osmosis (RO) membrane collocated with a new manufacturing process system in the semiconductor factory to reuse wasted copper polishing all year except the summer by varying the ratio of water production, desalination and operating pressure. By measuring total organic carbon (TOC) of permeate to determine the optimal parameter for system operation, thereby recycling the copper polishing effluents to ultra-pure water process and maximize water utilization. From the results, the newly designed process mode (ie, the first RO stage is production and second reverse osmosis stage is reflux) collocated with the new high-pressure RO membrane that can control total organic carbon as well as conform the ultra-pure water quality (<2.5 mg/L). The setting of operating parameters including production、rejection and pressure for RO unit in order to maintain stable and quality production with no damage or flux decrease in RO system. After copper polishing effluents treated by RO being reused to ultra-pure water system, the city water consumption can reduce about 100 ton each day calculated by water consumption of cooling tower. The water quality of each unit in ultra-pure system has no significant difference. If the RO osmosis unit could stable operation, the city water would reduce about 170,000 ton each year and it is equivalent to 5% of storage capacity in the reservoir (寶二).