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dc.contributor.authorFan, W. C.en_US
dc.contributor.authorHuang, S. H.en_US
dc.contributor.authorChou, W. C.en_US
dc.contributor.authorTsou, M. H.en_US
dc.contributor.authorYang, C. S.en_US
dc.contributor.authorChia, C. H.en_US
dc.contributor.authorNguyen Dang Phuen_US
dc.contributor.authorLuc Huy Hoangen_US
dc.date.accessioned2015-12-02T02:59:04Z-
dc.date.available2015-12-02T02:59:04Z-
dc.date.issued2015-09-01en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2015.02.094en_US
dc.identifier.urihttp://hdl.handle.net/11536/127834-
dc.description.abstractSelf-assembled type-II ZnTe quantum dots (QDs) were grown on GaAs (0 0 1) substrates with Zn1-xMgxSe (x=0.24 and 0.52) buffer layers by molecular beam epitaxy. The optical properties of ZnTe QDs were investigated by low-temperature photoluminescence (PL) and time-resolved PL. An abrupt variation of the PL peak energy with coverage implies the existence of wetting layer of 3.2 MLs and 40 MLs for the Mg concentration x=0.24 and 0.52, respectively. The thickness of wetting layer is larger than that of Zaire QDs grown on ZnSe buffer layers because the strain between ZaTe and Zn1-xMgxSe is smaller. The non-mono-exponential decay profiles reflect the processes of carrier transfer and recapture. The Kohlrausch\'s stretching exponential well fits the decay profiles of ZaTe/Zn1-xMgxSe QDs. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectMolecular beam epitaxyen_US
dc.subjectNanomaterialsen_US
dc.subjectZinc compoundsen_US
dc.subjectSemiconducting II-VI materialsen_US
dc.titleGrowth and optical properties of ZnTe quantum dots on ZnMgSe by molecular beam epitaxyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jcrysgro.2015.02.094en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume425en_US
dc.citation.spage186en_US
dc.citation.epage190en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000356669200043en_US
dc.citation.woscount0en_US
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