Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Liu, Jia-Zhe | en_US |
dc.contributor.author | Lin, Chung-Hsiang | en_US |
dc.contributor.author | Lee, Kang-Yuan | en_US |
dc.contributor.author | Wang, Yu-Li | en_US |
dc.contributor.author | Liao, Chien-Lan | en_US |
dc.contributor.author | Chang, Yung-Fu | en_US |
dc.contributor.author | Ho, Chong-Long | en_US |
dc.contributor.author | Wu, Meng-Chyi | en_US |
dc.date.accessioned | 2015-12-02T02:59:09Z | - |
dc.date.available | 2015-12-02T02:59:09Z | - |
dc.date.issued | 2015-07-01 | en_US |
dc.identifier.issn | 0018-9197 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/JQE.2015.2435658 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/127877 | - |
dc.description.abstract | In this paper, the performance improvement of 380-nm InGaN/AlGaN ultraviolet light-emitting diodes (UV-LEDs) is investigated by incorporating an undoped Al(In)GaN thin interlayer between the InGaN well and AlGaN barrier in multiquantum-well (MQW) active region. By inserting the graded-composition AlGaN and AlInGaN thin interlayers, the light output powers of UV-LEDs are significantly increased by 70% and 105% at 20 mA, respectively, as compared with the LED without the interlayer. Remarkable efficiency enhancement in the UV-LEDs with graded-composition AlGaN and AlInGaN interlayers is mainly attributed to the further improvement of the electron confinement and hole injection with more uniform distribution in the MQW active region. Besides, photoluminescence and atomic force microscope analyses indicate that the MQW quality can be enhanced by incorporating a graded-composition AlInGaN thin interlayer in the MQW active region of UV-LEDs. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Ultraviolet light-emitting diode (UV-LED) | en_US |
dc.subject | multi-quantum-well (MQW) | en_US |
dc.subject | Al(In)GaN interlayer | en_US |
dc.subject | photoluminescence (PL) | en_US |
dc.title | Performance Enhancement of Ultraviolet Light-Emitting Diodes by Incorporating a Thin Al(In)GaN Interlayer in Multiquantum-Well Region | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/JQE.2015.2435658 | en_US |
dc.identifier.journal | IEEE JOURNAL OF QUANTUM ELECTRONICS | en_US |
dc.citation.volume | 51 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000356295600001 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |