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dc.contributor.authorLiu, Kuan-Juen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorChen, Ching-Enen_US
dc.contributor.authorYang, Ren-Yaen_US
dc.contributor.authorTsai, Jyun-Yuen_US
dc.contributor.authorLu, Ying-Hsinen_US
dc.contributor.authorLiu, Xi-Wenen_US
dc.contributor.authorCheng, Osberten_US
dc.contributor.authorHuang, Cheng-Tungen_US
dc.date.accessioned2015-12-02T02:59:24Z-
dc.date.available2015-12-02T02:59:24Z-
dc.date.issued2015-08-24en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4929429en_US
dc.identifier.urihttp://hdl.handle.net/11536/128149-
dc.description.abstractThis letter investigates the mechanism of abnormal body current at the linear region in n-channel high-k/metal gate stack fin field effect transistors. Unlike body current, which is generated by impact ionization at high drain voltages, abnormal body current was found to increase with decreasing drain voltages. Notably, the unusual body leakage only occurs in three-dimensional structure devices. Based on measurements under different operation conditions, the abnormal body current can be attributed to fin surface defect-induced leakage current, and the mechanism is electron tunneling to the fin via the defects, resulting in holes left at the body terminal. (C) 2015 AIP Publishing LLC.en_US
dc.language.isoen_USen_US
dc.titleInvestigation of defect-induced abnormal body current in fin field-effect-transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4929429en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume107en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000360593900070en_US
dc.citation.woscount0en_US
Appears in Collections:Articles