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dc.contributor.authorLee, Y. J.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorSu, B. J.en_US
dc.contributor.authorWang, S. C.en_US
dc.date.accessioned2014-12-08T15:17:42Z-
dc.date.available2014-12-08T15:17:42Z-
dc.date.issued2006en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/12858-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2359701en_US
dc.description.abstractCharacteristics of GaN-based light-emitting diodes (LEDs) grown on the chemical wet-etched patterned sapphire substrates (CWE-PSS) with different crystallography-etched facets were investigated. An improvement of 40% on the overall quantum efficiency was achieved by adopting this CWE-PSS scheme. A Monte Carlo ray-tracing method was employed to derive the optimized condition of sapphire etching time, and the calculated result demonstrated the same trend with real device measurement. Adopting the CWE-PSS in LEDs could not only improve the epitaxial quality but also increase the extraction quantum efficiency due to crystallography-etched facets efficiently scattering the guided light to enter the escape cone on the top of device surfaces. Finally, we observed better aging behaviors of CWE-PSS LEDs, which could be due to the reduction of threading dislocations of the epitaxial layers. (c) 2006 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleFabrication and characterization of GaN-based LEDs grown on chemical wet-etched patterned sapphire substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2359701en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume153en_US
dc.citation.issue12en_US
dc.citation.spageG1106en_US
dc.citation.epageG1111en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000241757400074-
dc.citation.woscount31-
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