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dc.contributor.authorChen, Chih-Jungen_US
dc.contributor.authorChen, Po-Tzuen_US
dc.contributor.authorBasu, Mrinmoyeeen_US
dc.contributor.authorYang, Kai-Chihen_US
dc.contributor.authorLu, Ying-Ruien_US
dc.contributor.authorDong, Chung-Lien_US
dc.contributor.authorMa, Chong-Gengen_US
dc.contributor.authorShen, Chin-Changen_US
dc.contributor.authorHu, Shu-Fenen_US
dc.contributor.authorLiu, Ru-Shien_US
dc.date.accessioned2016-03-28T00:04:14Z-
dc.date.available2016-03-28T00:04:14Z-
dc.date.issued2015-01-01en_US
dc.identifier.issn2050-7488en_US
dc.identifier.urihttp://dx.doi.org/10.1039/c5ta06202ken_US
dc.identifier.urihttp://hdl.handle.net/11536/129441-
dc.description.abstractAn integrated cobalt disulfide (CoS2) co-catalyst passivation layer on Si microwires (MWs) was used as a photocathode for solar hydrogen evolution. Si MWs were prepared by photolithography and dry etching techniques. The CoS2Si photocathodes were subsequently prepared by chemical deposition and thermal sulfidation of the Co(OH)(2) outer shell. The optimized onset potential and photocurrent of the CoS2Si electrode were 0.248 V and -3.22 mA cm(-2) (at 0 V), respectively. The best photocatalytic activity of the CoS2Si electrode resulted from lower charge transfer resistances among the photoabsorber, co-catalyst, and redox couples in the electrolyte. X-ray absorption near edge structure was conducted to investigate the unoccupied electronic states of the CoS2 layer. We propose that more vacancies in the S-3p unoccupied states of the CoS2Si electrode were present with a lower negative charge of S-2(2-) to form weaker S-H bond strength, promoting water splitting efficiency. Moreover, the CoS2 co-catalyst that completely covered underlying Si MWs served as a passivation layer to prevent oxidation and reduce degradation during photoelectrochemical measurements. Therefore, the optimal CoS2Si electrode maintained the photocurrent at about -3 mA cm-2 (at 0 V) for 9 h, and its hydrogen generation rate was approximately 0.833 mu mol min(-1).en_US
dc.language.isoen_USen_US
dc.titleAn integrated cobalt disulfide (CoS2) co-catalyst passivation layer on silicon microwires for photoelectrochemical hydrogen evolutionen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c5ta06202ken_US
dc.identifier.journalJOURNAL OF MATERIALS CHEMISTRY Aen_US
dc.citation.issue46en_US
dc.citation.spage23466en_US
dc.citation.epage23476en_US
dc.contributor.department加速器光源科技與應用學位學程zh_TW
dc.contributor.departmentMaster and Ph.D. Program for Science and Technology of Accelrrator Light Sourceen_US
dc.identifier.wosnumberWOS:000365216000047en_US
dc.citation.woscount0en_US
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