標題: Impact of Quantum Capacitance on Intrinsic Inversion Capacitance Characteristics and Inversion-Charge Loss for Multigate III-V-on-Insulator nMOSFETs
作者: Shen, Hsin-Hung
Shen, Shih-Lun
Yu, Chang-Hung
Su, Pin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: III-V MOSFET;multigate MOSFET;quantum capacitance
公開日期: 1-一月-2016
摘要: This paper investigates the impact of quantum capacitance on the intrinsic inversion-capacitance (C-inv) characteristics of high-mobility multigate III-V-on-insulator nMOSFETs through a numerical simulation corroborated by the theoretical calculation. Nonmonotonic C-inv characteristics stemming from the energy dependence of 1-D density-of-states and significant C-inv degradation due to quantum capacitance have been found in trigate In0.53Ga0.47As and InAs devices based on the ITRS 2018-2024 technology nodes. This paper indicates that, to compensate the excess inversion-charge (Q(inv)) loss due to quantum capacitance, the needed mobility gain of the trigate InGaAs and InAs devices (against the Si counterparts) should be at least similar to 3x and similar to 4x, respectively. This paper also suggests that the quantum-capacitance-induced Q(inv) loss can be mitigated by raising the fin aspect ratio of the III-V multigate device.
URI: http://dx.doi.org/10.1109/TED.2015.2500915
http://hdl.handle.net/11536/129505
ISSN: 0018-9383
DOI: 10.1109/TED.2015.2500915
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 63
起始頁: 339
結束頁: 344
顯示於類別:期刊論文