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dc.contributor.authorYing, L. Y.en_US
dc.contributor.authorHu, X. L.en_US
dc.contributor.authorLiu, W. J.en_US
dc.contributor.authorZhang, J. Y.en_US
dc.contributor.authorZhang, B. P.en_US
dc.contributor.authorKuo, H. C.en_US
dc.date.accessioned2016-03-28T00:04:19Z-
dc.date.available2016-03-28T00:04:19Z-
dc.date.issued2015-12-01en_US
dc.identifier.issn0749-6036en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.spmi.2015.10.020en_US
dc.identifier.urihttp://hdl.handle.net/11536/129550-
dc.description.abstractOptical losses in GaN-based resonant planar cavity are discussed and experimentally examined in respects of indium tin oxide (ITO) inner-cavity current spreading layer, the defect-rich GaN layer, and multi-quantum well (MQW) active region. Devices with different structures are adopted to study the optical loss. It is demonstrated that a thin ITO layer and a coupled MQW active region are essential to achieve a low loss and high Q-value cavity. The results show that low-loss MQW design is particularly important in fabricating high-Q value GaN-based planar cavities. (C) 2015 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectVCSELen_US
dc.subjectWide gap semiconductoren_US
dc.subjectOptical lossen_US
dc.subjectVertical cavity surface emitting lasersen_US
dc.subjectGallium nitrideen_US
dc.subjectRCLEDen_US
dc.titleControl of optical loss in GaN-based planar cavitiesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.spmi.2015.10.020en_US
dc.identifier.journalSUPERLATTICES AND MICROSTRUCTURESen_US
dc.citation.volume88en_US
dc.citation.spage561en_US
dc.citation.epage566en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000367276600067en_US
dc.citation.woscount0en_US
Appears in Collections:Articles