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dc.contributor.authorHsieh, D. H.en_US
dc.contributor.authorTzou, A. J.en_US
dc.contributor.authorKao, T. S.en_US
dc.contributor.authorLai, F. I.en_US
dc.contributor.authorLin, D. W.en_US
dc.contributor.authorLin, B. C.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorLai, W. C.en_US
dc.contributor.authorChen, C. H.en_US
dc.contributor.authorKuo, H. C.en_US
dc.date.accessioned2019-04-03T06:45:07Z-
dc.date.available2019-04-03T06:45:07Z-
dc.date.issued2015-10-19en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.23.027145en_US
dc.identifier.urihttp://hdl.handle.net/11536/129588-
dc.description.abstractIn this report, the improved lasing performance of the III-nitride based vertical-cavity surface-emitting laser (VCSEL) has been demonstrated by replacing the bulk AlGaN electron blocking layer (EBL) in the conventional VCSEL structure with an AlGaN/GaN multiple quantum barrier (MQB) EBL. The output power can be enhanced up to three times from 0.3 mW to 0.9 mW. In addition, the threshold current density of the fabricated device with the MQB-EBL was reduced from 12 kA/cm(2) (9.5 mA) to 10.6 kA/cm(2) (8.5 mA) compared with the use of the bulk AlGaN EBL. Theoretical calculation results suggest that the improved carrier injection efficiency can be mainly attributed to the partial release of the strain and the effect of quantum interference by using the MQB structure, hence increasing the effective barrier height of the conduction band. (C) 2015 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleImproved carrier injection in GaN-based VCSEL via AlGaN/GaN multiple quantum barrier electron blocking layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.23.027145en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume23en_US
dc.citation.issue21en_US
dc.citation.spage27145en_US
dc.citation.epage27151en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000366574400026en_US
dc.citation.woscount18en_US
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