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dc.contributor.authorChen, Kai-Huangen_US
dc.contributor.authorChang, Kuan-Changen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorTsai, Tsung-Mingen_US
dc.contributor.authorLiang, Shu-Pingen_US
dc.contributor.authorYoung, Tai-Faen_US
dc.contributor.authorSyu, Yong-Enen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2019-04-03T06:44:32Z-
dc.date.available2019-04-03T06:44:32Z-
dc.date.issued2016-02-01en_US
dc.identifier.issn1556-276Xen_US
dc.identifier.urihttp://dx.doi.org/10.1186/s11671-016-1272-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/129643-
dc.description.abstractBipolar switching resistance behaviors of the Gd:SiO2 resistive random access memory (RRAM) devices on indium tin oxide electrode by the low-temperature supercritical CO2-treated technology were investigated. For physical and electrical measurement results obtained, the improvement on oxygen qualities, properties of indium tin oxide electrode, and operation current of the Gd:SiO2 RRAM devices were also observed. In addition, the initial metallic filament-forming model analyses and conduction transferred mechanism in switching resistance properties of the RRAM devices were verified and explained. Finally, the electrical reliability and retention properties of the Gd:SiO2 RRAM devices for low-resistance state (LRS)/high-resistance state (HRS) in different switching cycles were also measured for applications in nonvolatile random memory devices.en_US
dc.language.isoen_USen_US
dc.subjectNonvolatile memoryen_US
dc.subjectGadoliniumen_US
dc.subjectSupercritical CO2en_US
dc.subjectResistive switchingen_US
dc.subjectSilicon oxideen_US
dc.titleImprovement of Bipolar Switching Properties of Gd:SiOx RRAM Devices on Indium Tin Oxide Electrode by Low-Temperature Supercritical CO2 Treatmenten_US
dc.typeArticleen_US
dc.identifier.doi10.1186/s11671-016-1272-5en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.citation.volume11en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000369340700011en_US
dc.citation.woscount3en_US
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