完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Kai-Huang | en_US |
dc.contributor.author | Chang, Kuan-Chang | en_US |
dc.contributor.author | Chang, Ting-Chang | en_US |
dc.contributor.author | Tsai, Tsung-Ming | en_US |
dc.contributor.author | Liang, Shu-Ping | en_US |
dc.contributor.author | Young, Tai-Fa | en_US |
dc.contributor.author | Syu, Yong-En | en_US |
dc.contributor.author | Sze, Simon M. | en_US |
dc.date.accessioned | 2019-04-03T06:44:32Z | - |
dc.date.available | 2019-04-03T06:44:32Z | - |
dc.date.issued | 2016-02-01 | en_US |
dc.identifier.issn | 1556-276X | en_US |
dc.identifier.uri | http://dx.doi.org/10.1186/s11671-016-1272-5 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/129643 | - |
dc.description.abstract | Bipolar switching resistance behaviors of the Gd:SiO2 resistive random access memory (RRAM) devices on indium tin oxide electrode by the low-temperature supercritical CO2-treated technology were investigated. For physical and electrical measurement results obtained, the improvement on oxygen qualities, properties of indium tin oxide electrode, and operation current of the Gd:SiO2 RRAM devices were also observed. In addition, the initial metallic filament-forming model analyses and conduction transferred mechanism in switching resistance properties of the RRAM devices were verified and explained. Finally, the electrical reliability and retention properties of the Gd:SiO2 RRAM devices for low-resistance state (LRS)/high-resistance state (HRS) in different switching cycles were also measured for applications in nonvolatile random memory devices. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Nonvolatile memory | en_US |
dc.subject | Gadolinium | en_US |
dc.subject | Supercritical CO2 | en_US |
dc.subject | Resistive switching | en_US |
dc.subject | Silicon oxide | en_US |
dc.title | Improvement of Bipolar Switching Properties of Gd:SiOx RRAM Devices on Indium Tin Oxide Electrode by Low-Temperature Supercritical CO2 Treatment | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1186/s11671-016-1272-5 | en_US |
dc.identifier.journal | NANOSCALE RESEARCH LETTERS | en_US |
dc.citation.volume | 11 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000369340700011 | en_US |
dc.citation.woscount | 3 | en_US |
顯示於類別: | 期刊論文 |