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dc.contributor.authorLee, CHen_US
dc.contributor.authorChiu, Yen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:17:53Z-
dc.date.available2014-12-08T15:17:53Z-
dc.date.issued2005-12-12en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OPEX.13.010292en_US
dc.identifier.urihttp://hdl.handle.net/11536/12969-
dc.description.abstractA surface-micromachined high-extinction-ratio polarizing beam splitter (PBS) using low absorptive silicon nitride layers for blue wavelength applications are demonstrated. The micro polarizing beam splitter consists of novel stack of two silicon nitride layers separated by an air gap. A PBS optimization model is established to achieve both high extinction-ratio and adequate process margin. The polarization extinction ratios of 25 dB for the reflected light and 15 dB for the transmitted light were experimentally achieved lambda=405 nm. The fabrication of the PBS is compatible with other micro diffractive elements to build a micro optical bench, thus, feasible for short wavelength optical storage applications. (c) 2005 Optical Society of America.en_US
dc.language.isoen_USen_US
dc.titleHigh-extinction-ratio micro polarizing beam splitter for short wavelength optical storage applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OPEX.13.010292en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume13en_US
dc.citation.issue25en_US
dc.citation.spage10292en_US
dc.citation.epage10301en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000233971500040-
dc.citation.woscount5-
Appears in Collections:Articles


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