標題: N incorporation into InGaAs cap layer in InAs self-assembled quantum dots
作者: Chen, JF
Hsiao, RS
Hsieh, PC
Chen, YJ
Chen, YP
Wang, JS
Chi, JY
電子物理學系
Department of Electrophysics
公開日期: 1-十二月-2005
摘要: This study presents the results of incorporating N into self-assembled InAs quantum dots (QDs) capped with an InGaAs cap layer. Experimental results indicate that such incorporation can redshift the QD ground state and decrease the energy spacing between the QD ground and first excited states. However, this incorporation reduces the potential barrier of the cap layer, increasing the electron escape from the QDs. Capacitance-voltage profiling shows that a broad shoulder corresponding to the electron emission from the QD ground to first-excited state cannot be resolved from the peak related to the electron emission from the excited states upon this incorporation. This finding implies that this incorporation reduces the energy spacing between the QD ground and first-excited states in the conduction band, thus correlating well with the photoluminescence data. In contrast, incorporating N directly into the InAs QD produces no redshift of the emission wavelength but introduces a deep trap at similar to 0.21 eV that depletes the electrons in the QDs. (c) 2005 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.2140891
http://hdl.handle.net/11536/12975
ISSN: 0021-8979
DOI: 10.1063/1.2140891
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 98
Issue: 11
結束頁: 
顯示於類別:期刊論文


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