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dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.date.accessioned2016-03-28T00:05:44Z-
dc.date.available2016-03-28T00:05:44Z-
dc.date.issued2014-01-01en_US
dc.identifier.issn2160-5033en_US
dc.identifier.urihttp://hdl.handle.net/11536/129802-
dc.description.abstractWe simulate the electric field distribution in single-photon avalanche diodes (SPADs) fabricated by CMOS 0.25-mu m high-voltage technology to explain the observed non-uniform 2-D photo-count mapping. The cause of non-uniform electric field distribution at the breakdown voltage is discussed with the aid of simulation. A method for improving the electric field uniformity is also proposed accordingly.en_US
dc.language.isoen_USen_US
dc.titleSIMULATION OF ELECTRIC FIELD DISTRIBUTION IN CMOS SINGLE PHOTON AVALANCHE DIODES AT BREAKDOWN VOLTAGEen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS (OMN)en_US
dc.citation.spage187en_US
dc.citation.epage188en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000366524800094en_US
dc.citation.woscount1en_US
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