完整後設資料紀錄
DC 欄位語言
dc.contributor.author呂志鵬zh_TW
dc.contributor.authorLeu Jihperngen_US
dc.date.accessioned2016-03-28T08:17:52Z-
dc.date.available2016-03-28T08:17:52Z-
dc.date.issued2015en_US
dc.identifier.govdocMOST103-2221-E009-181-MY3zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/130507-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=11265363&docId=453651en_US
dc.description.sponsorship科技部zh_TW
dc.language.isozh_TWen_US
dc.title超低介電碳氮化矽薄膜之研究zh_TW
dc.titleFabrication and Development of Ultra-Low-K Silcion Carbonitride Filmsen_US
dc.typePlanen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
顯示於類別:研究計畫