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dc.contributor.authorYang, CCen_US
dc.contributor.authorLin, CCen_US
dc.contributor.authorPeng, CHen_US
dc.contributor.authorChen, SYen_US
dc.date.accessioned2014-12-08T15:18:04Z-
dc.date.available2014-12-08T15:18:04Z-
dc.date.issued2005-11-15en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2005.07.048en_US
dc.identifier.urihttp://hdl.handle.net/11536/13063-
dc.description.abstractZnO films were pre-treated with nitrogen implantation in the range from 5 x 10(12) to 5 x 10(15) cm(-2). Effect of nitrogen concentration on structural crystallinity and photoluminescence properties of nitrogen-implanted ZnO films under different atmospheres and annealing treatments was investigated. It was found that there exists a solubility issue of nitrogen in ZnO films at 850 degrees C via secondary ion mass spectrometry (SIMS). It was found that the peak intensity of near band-edge (NBE) emission remarkably decreases with the increase of concentration of implanted nitrogen if annealed in nitrogen atmosphere due to the increased oxygen vacancies. However, when the ZnO was implanted with 5 x 10(12) cm(-2) and annealed in oxygen atmosphere, the optical properties are improved probably because the effective incorporation of O atom diminishes those donor levels (oxygen vacancies) and the crystallinity is also improved due to implanted nitrogen. However, excess nitrogen would reduce the crystallinity and promote the formation of the deep-level emission due to high amount of intrinsic and structure defects. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectphotoluminescenceen_US
dc.subjectZnOen_US
dc.subjectnitrogen implantationen_US
dc.subjectannealing atmosphereen_US
dc.titleEffect of annealing atmosphere on physical characteristics and photoluminescence properties of nitrogen-implanted ZnO thin filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jcrysgro.2005.07.048en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume285en_US
dc.citation.issue1-2en_US
dc.citation.spage96en_US
dc.citation.epage102en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000233152500014-
dc.citation.woscount8-
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