| 標題: | 低溫成長之Si/SiGe元件之研究 Low Temperature Deposited Si/Sige Devices |
| 作者: | 張俊彥 交通大學電子研究所 |
| 關鍵字: | ; |
| 公開日期: | 1993 |
| 摘要: | |
| 官方說明文件#: | NSC82-0404-E009-233 |
| URI: | https://www.grb.gov.tw/search/planDetail?id=45958&docId=6596 http://hdl.handle.net/11536/132159 |
| 顯示於類別： | 研究計畫 |
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- Nanocone SiGe antireflective thin films fabricated by ultrahigh-vacuum chemical vapor deposition with in situ annealing / Chang, Yuan-Ming;Dai, Ching-Liang;Cheng, Tsung-Chieh;Hsu, Che-Wei
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- The effect of native oxide on epitaxial SiGe from deposited amorphous Ge on Si / Wu, YH;Chen, WJ;Chin, A;Tsai, C
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