加速加熱化學氣相沈積對超薄介電層和選擇性磊晶之研究(II)

Title:	加速加熱化學氣相沈積對超薄介電層和選擇性磊晶之研究(II) Rapid Thermal Chemical Vapor Deposition for Ultrathin Dielectrics & Selective Epitaxy (II)
Authors:	蘇翔孫喜眾交通大學電子研究所
Keywords:	;
Issue Date:	1993
Abstract:
Gov't Doc #:	NSC82-0404-E009-234
URI:	https://www.grb.gov.tw/search/planDetail?id=45972&docId=6597 http://hdl.handle.net/11536/132160
Appears in Collections:	Research Plans