Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 張淑閔 | en_US |
dc.contributor.author | 方峙翔 | en_US |
dc.contributor.author | 徐樹剛 | en_US |
dc.date.accessioned | 2016-12-20T05:04:19Z | - |
dc.date.available | 2016-12-20T05:04:19Z | - |
dc.date.issued | 2016-04-01 | en_US |
dc.identifier.govdoc | C08L083/04 | zh_TW |
dc.identifier.govdoc | C08F002/44 | zh_TW |
dc.identifier.govdoc | C08J003/24 | zh_TW |
dc.identifier.govdoc | C08J009/28 | zh_TW |
dc.identifier.govdoc | B01D011/04 | zh_TW |
dc.identifier.govdoc | G01N030/00 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/132266 | - |
dc.description.abstract | 本發明提供一種表層拓印高分子及其製備方法,該製備方法包含:將功能性單體、交聯劑、標的物模板溶於溶劑中以獲得前驅混合物,其中功能性單體之水解縮合速率係低於交聯劑之水解縮合速率,交聯劑之濃度大於功能性單體,且功能性單體與標的物模板形成一複合物;使前驅混合物之交聯劑進行聚合反應,以獲得聚合物,其中交聯劑依複合物之立體結構進行聚合反應以將複合物包埋於聚合物之內部或表層;之後移除聚合物中之標的物模板以形成拓印孔洞並露出功能性單體,從而獲得表層拓印高分子。 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 表層拓印高分子及其製備方法 | zh_TW |
dc.type | Patents | en_US |
dc.citation.patentcountry | TWN | zh_TW |
dc.citation.patentnumber | 201612244 | zh_TW |
Appears in Collections: | Patents |
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