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dc.contributor.authorChen, Kun-Huangen_US
dc.contributor.authorChen, Jing-Hengen_US
dc.contributor.authorTseng, Hua-Kenen_US
dc.contributor.authorChang, Wei-Yaoen_US
dc.date.accessioned2019-04-03T06:39:51Z-
dc.date.available2019-04-03T06:39:51Z-
dc.date.issued2016-06-01en_US
dc.identifier.issn0091-3286en_US
dc.identifier.urihttp://dx.doi.org/10.1117/1.OE.55.6.064102en_US
dc.identifier.urihttp://hdl.handle.net/11536/132580-
dc.description.abstractWe propose a stress measurement system based on a projection moire method and heterodyne interferometry for thin films on a flexible substrate. In the measurement setup, a CMOS camera in which every pixel can receive a series of heterodyne moire signals by using a continuously relative displacement with a constant velocity is used. Furthermore, the phase of the optimized sinusoidal curve and the surface profile of the flexible substrate are determined using a least-squares sine fitting algorithm. The thin-film stress is obtained by representing the cross-sectional curve of the surface profile by using a polynomial fitting method, estimating the resultant curvature radii of the uncoated and coated substrates, and using these two radii in the corrected Stoney formula. The proposed measurement system has the advantages of high accuracy, high resolution, and high capacity for substrates with high flexibility and a large measurement depth. (C) The Authors.en_US
dc.language.isoen_USen_US
dc.subjectflexible substrateen_US
dc.subjectthin-film stress measurementen_US
dc.subjectprojection moireen_US
dc.subjectTalbot effecten_US
dc.subjectheterodyne interferometryen_US
dc.titleStress measurement of thin film on flexible substrate by using projection moire method and heterodyne interferometryen_US
dc.typeArticleen_US
dc.identifier.doi10.1117/1.OE.55.6.064102en_US
dc.identifier.journalOPTICAL ENGINEERINGen_US
dc.citation.volume55en_US
dc.citation.issue6en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000383253900014en_US
dc.citation.woscount0en_US
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