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dc.contributor.authorChen, Yu-Zeen_US
dc.contributor.authorMedina, Henryen_US
dc.contributor.authorWang, Sheng-Wenen_US
dc.contributor.authorSu, Teng-Yuen_US
dc.contributor.authorLi, Jian-Guangen_US
dc.contributor.authorYen, Wen-Chunen_US
dc.contributor.authorCheng, Kai-Yuanen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorShen, Guozhenen_US
dc.contributor.authorChueh, Yu-Lunen_US
dc.date.accessioned2017-04-21T06:55:54Z-
dc.date.available2017-04-21T06:55:54Z-
dc.date.issued2016-02-23en_US
dc.identifier.issn0897-4756en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acs.chemmater.5b04579en_US
dc.identifier.urihttp://hdl.handle.net/11536/132586-
dc.description.abstractTo date, the chemical vapor deposition (CVD) process is the most popular approach because of its high yield and quality. Nevertheless, the need for a high temperature and the relatively long process time within each cycle hinder the commercial development in terms of production cost. In this work, we demonstrate a fast (<3 min) and feasible approach to synthesizing a few-layers of WSe2 and MoSe2 on arbitrary substrates by a microwave-assisted selenization process. The transition metal dichalcogenides (TMDs) can be patterned by standard photolithography. Furthermore, controllable layered growth from horizontal to vertical alignment can be achieved, leading to an enhanced chemical catalytic activity caused by large edge sites (exposed areas). As a proof, a highly sensitive NO gas sensor based on vertical WSe2 was fabricated. Moreover, our microwave assisted selenization process can be further extended to achieve other two-dimensional TMD materials because of the simplicity of the process.en_US
dc.language.isoen_USen_US
dc.titleLow-Temperature and Ultrafast Synthesis of Patternable Few-Layer Transition Metal Dichacogenides with Controllable Stacking Alignment by a Microwave-Assisted Selenization Processen_US
dc.identifier.doi10.1021/acs.chemmater.5b04579en_US
dc.identifier.journalCHEMISTRY OF MATERIALSen_US
dc.citation.volume28en_US
dc.citation.issue4en_US
dc.citation.spage1147en_US
dc.citation.epage1154en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000370987300019en_US
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