完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, Yong-Minen_US
dc.contributor.authorChung, Tsai-Weien_US
dc.contributor.authorWu, Pu-Weien_US
dc.contributor.authorChen, Po-Chunen_US
dc.date.accessioned2017-04-21T06:56:49Z-
dc.date.available2017-04-21T06:56:49Z-
dc.date.issued2017-01-25en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2016.09.064en_US
dc.identifier.urihttp://hdl.handle.net/11536/132593-
dc.description.abstractElectrostimulation medical devices for neural diseases require electroactive and biocompatible interface materials to transmit signals from electrodes to targeting tissues. Iridium oxide is an attractive ceramic material for neurostimulation electrodes due to its desirable stability and biocompatibility. In this study, we developed a cost effective and thickness controllable process to fabricate iridium oxide film by chemical bath deposition (CIROF). Surface morphology, crystallinity, roughness, hydrophilicity, and charge storage capacity as well as biocompatibility of the CIROFs with different thicknesses were analyzed. Accordingly, the CIROFs present rough and hydrophilic surfaces for cell attachment and good biocompatibility for cell viability. In addition, the charge storage capacity (CSC) of the as-deposited and the annealed CIROFs were 78.29 mC/cm(2) and 71.76 mC/cm(2), respectively. Consequently, these results show advantages that make the CIROF a promising neurostimulation electrode material for implantable medical devices in neural systems. (C) 2016 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectNeurostimulationen_US
dc.subjectBio-interfaceen_US
dc.subjectBiocompatible electrostimulation electrodeen_US
dc.subjectIridium oxideen_US
dc.subjectChemical bath depositionen_US
dc.titleA cost-effective fabrication of iridium oxide films as biocompatible electrostimulation electrodes for neural interface applicationsen_US
dc.identifier.doi10.1016/j.jallcom.2016.09.064en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume692en_US
dc.citation.spage339en_US
dc.citation.epage345en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000386231200043en_US
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