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dc.contributor.authorShaban, F.en_US
dc.contributor.authorAshari, M.en_US
dc.contributor.authorLorenz, T.en_US
dc.contributor.authorRau, R.en_US
dc.contributor.authorScheer, E.en_US
dc.contributor.authorKono, K.en_US
dc.contributor.authorRees, D. G.en_US
dc.contributor.authorLeiderer, P.en_US
dc.date.accessioned2017-04-21T06:56:47Z-
dc.date.available2017-04-21T06:56:47Z-
dc.date.issued2016-11en_US
dc.identifier.issn0022-2291en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s10909-016-1641-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/132620-
dc.description.abstractWe present transport measurements of surface-state electrons on liquid helium films in confined geometry. The measurements are taken using split-gate devices similar to a field effect transistor. The number of electrons passing between the source and drain areas of the device can be precisely controlled by changing the length of the voltage pulse applied to the gate electrode. We find evidence that the effective driving potential depends on electron-electron interactions, as well as the electric field applied to the substrate. Our measurements indicate that the mobility of electrons on helium films can be high and that microfabricated transistor devices allow electron manipulation on length scales close to the interelectron separation. Our experiment is an important step toward investigations of surface-state electron properties at much higher densities, for which the quantum melting of the system to a degenerate Fermi gas should be observed.en_US
dc.language.isoen_USen_US
dc.subjectHelium field effect transistoren_US
dc.subjectSurface electronsen_US
dc.subjectHelium filmen_US
dc.subjectElectron transporten_US
dc.subjectConfined geometryen_US
dc.titleThe Helium Field Effect Transistor (II): Gated Transport of Surface-State Electrons Through Micro-constrictionsen_US
dc.identifier.doi10.1007/s10909-016-1641-6en_US
dc.identifier.journalJOURNAL OF LOW TEMPERATURE PHYSICSen_US
dc.citation.volume185en_US
dc.citation.issue3-4en_US
dc.citation.spage339en_US
dc.citation.epage353en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000385409200015en_US
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