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dc.contributor.authorLai, Yi-Chunen_US
dc.contributor.authorHigo, Akioen_US
dc.contributor.authorKiba, Takayukien_US
dc.contributor.authorThomas, Cedricen_US
dc.contributor.authorChen, Shulaen_US
dc.contributor.authorLee, Chang Yongen_US
dc.contributor.authorTanikawa, Tomoyukien_US
dc.contributor.authorKuboya, Shigeyukien_US
dc.contributor.authorKatayama, Ryujien_US
dc.contributor.authorShojiki, Kanakoen_US
dc.contributor.authorTakayama, Junichien_US
dc.contributor.authorYamashita, Ichiroen_US
dc.contributor.authorMurayama, Akihiroen_US
dc.contributor.authorChi, Gou-Chungen_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorSamukawa, Seijien_US
dc.date.accessioned2017-04-21T06:56:44Z-
dc.date.available2017-04-21T06:56:44Z-
dc.date.issued2016-10-21en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/27/42/425401en_US
dc.identifier.urihttp://hdl.handle.net/11536/132626-
dc.description.abstractIn this work, we demonstrate homogeneously distributed In0.3Ga0.7N/GaN quantum disks (QDs), with an average diameter below 10 nm and a high density of 2.1 x 10(11) cm(-2), embedded in 20 nm tall nanopillars. The scalable top-down fabrication process involves the use of self-assembled ferritin bio-templates as the etch mask, spin coated on top of a strained In0.3Ga0.7N/GaN single quantum well (SQW) structure, followed by a neutral beam etch (NBE) method. The small dimensions of the iron cores inside ferritin and nearly damage-free process enabled by the NBE jointly contribute to the observation of photoluminescence (PL) from strain-relaxed In0.3Ga0.7N/GaN QDs at 6 K. The large blueshift of the peak wavelength by over 70 nm manifests a strong reduction of the quantum-confined Stark effect (QCSE) within the QD structure, which also agrees well with the theoretical prediction using a 3D Schrodinger equation solver. The current results hence pave the way towards the realization of large-scale III-N quantum structures using the combination of bio-templates and NBE, which is vital for the development of next-generation lighting and communication devices.en_US
dc.language.isoen_USen_US
dc.subjectquantum disksen_US
dc.subjectneutral beam etchen_US
dc.subjectbio-templateen_US
dc.subjectInGaN/GaNen_US
dc.subjectsingle quantum wellen_US
dc.titleNanometer scale fabrication and optical response of InGaN/GaN quantum disksen_US
dc.identifier.doi10.1088/0957-4484/27/42/425401en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume27en_US
dc.citation.issue42en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000385483400001en_US
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