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dc.contributor.authorLu, Chih-Hungen_US
dc.contributor.authorHou, Tuo-Hungen_US
dc.contributor.authorPan, Tung-Mingen_US
dc.date.accessioned2017-04-21T06:56:20Z-
dc.date.available2017-04-21T06:56:20Z-
dc.date.issued2016-12en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2016.2614959en_US
dc.identifier.urihttp://hdl.handle.net/11536/132764-
dc.description.abstractIn this brief, we developed a low-voltage (V-DS = 0.5 V and V-GS = 0.8 V) InGaZnO ion-sensitive thin-film transistor (ISTFT) sensor using a high-kappa HfO2 sensing membrane grown by low-temperature atomic layer deposition. The InGaZnO TFT exhibited a low threshold voltage of 0.2 V, a high field-effect mobility of 5.9 cm(2)/V-s, a small subthreshold swing of 90 mV/decade, and high I-ON/I-OFF ratio of 2.4x10(7). The pH sensor based on an InGaZnO ISTFT device exhibits a high sensitivity of 60.5 mV/pH and good linearity in the pH range from 3 to 11. Moreover, such a pH ISTFT sensor presents a hysteresis width of 8 mV after a pH loop of 7 -> 4 -> 7 -> 10 -> 7 and a low drift rate of 2.5 mV/h at pH 7.en_US
dc.language.isoen_USen_US
dc.subjectHfO2en_US
dc.subjectInGaZnOen_US
dc.subjection-sensitive thin-film transistor (ISTFT)en_US
dc.subjectpH sensitivityen_US
dc.titleLow-Voltage InGaZnO Ion-Sensitive Thin-Film Transistors Fabricated by Low-Temperature Processen_US
dc.identifier.doi10.1109/TED.2016.2614959en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume63en_US
dc.citation.issue12en_US
dc.citation.spage5060en_US
dc.citation.epage5063en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000389342200068en_US
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