完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lu, Chih-Hung | en_US |
dc.contributor.author | Hou, Tuo-Hung | en_US |
dc.contributor.author | Pan, Tung-Ming | en_US |
dc.date.accessioned | 2017-04-21T06:56:20Z | - |
dc.date.available | 2017-04-21T06:56:20Z | - |
dc.date.issued | 2016-12 | en_US |
dc.identifier.issn | 0018-9383 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TED.2016.2614959 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/132764 | - |
dc.description.abstract | In this brief, we developed a low-voltage (V-DS = 0.5 V and V-GS = 0.8 V) InGaZnO ion-sensitive thin-film transistor (ISTFT) sensor using a high-kappa HfO2 sensing membrane grown by low-temperature atomic layer deposition. The InGaZnO TFT exhibited a low threshold voltage of 0.2 V, a high field-effect mobility of 5.9 cm(2)/V-s, a small subthreshold swing of 90 mV/decade, and high I-ON/I-OFF ratio of 2.4x10(7). The pH sensor based on an InGaZnO ISTFT device exhibits a high sensitivity of 60.5 mV/pH and good linearity in the pH range from 3 to 11. Moreover, such a pH ISTFT sensor presents a hysteresis width of 8 mV after a pH loop of 7 -> 4 -> 7 -> 10 -> 7 and a low drift rate of 2.5 mV/h at pH 7. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | HfO2 | en_US |
dc.subject | InGaZnO | en_US |
dc.subject | ion-sensitive thin-film transistor (ISTFT) | en_US |
dc.subject | pH sensitivity | en_US |
dc.title | Low-Voltage InGaZnO Ion-Sensitive Thin-Film Transistors Fabricated by Low-Temperature Process | en_US |
dc.identifier.doi | 10.1109/TED.2016.2614959 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | en_US |
dc.citation.volume | 63 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 5060 | en_US |
dc.citation.epage | 5063 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000389342200068 | en_US |
顯示於類別: | 期刊論文 |