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dc.contributor.authorLin, Bi-Hsuanen_US
dc.contributor.authorChen, Huang-Yehen_US
dc.contributor.authorTseng, Shao-Chinen_US
dc.contributor.authorWu, Jian-Xingen_US
dc.contributor.authorChen, Bo-Yien_US
dc.contributor.authorLee, Chien-Yuen_US
dc.contributor.authorYin, Gung-Chianen_US
dc.contributor.authorChang, Shih-Hungen_US
dc.contributor.authorTang, Mau-Tsuen_US
dc.contributor.authorHsieh, Wen-Fengen_US
dc.date.accessioned2017-04-21T06:55:58Z-
dc.date.available2017-04-21T06:55:58Z-
dc.date.issued2016-11-07en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4967743en_US
dc.identifier.urihttp://hdl.handle.net/11536/132820-
dc.description.abstractThe temperature-dependent hard X-ray excited optical luminescence (XEOL) spectroscopy was used to study the optical properties of O and Zn polarity of a c-plane single crystal ZnO wafer. By analyzing the XEOL and XRD, we found an unprecedented blue shift of the free exciton transition with increasing the excited carrier density as tuning the X-ray energy across the Zn K-edge, and the O-polar face possesses better crystal structure than the Zn-polar one. This spectral blue shift is attributed to the Coulomb screening of the spontaneous polarization by the excited free carriers that result in decreasing the exciton-phonon Frohlich interaction to reduce exciton binding energy. Published by AIP Publishing.en_US
dc.language.isoen_USen_US
dc.titleProbing the exciton-phonon coupling strengths of O-polar and Zn-polar ZnO wafer using hard X-ray excited optical luminescenceen_US
dc.identifier.doi10.1063/1.4967743en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume109en_US
dc.citation.issue19en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000387999600025en_US
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