標題: | Room temperature fabrication of titanium nitride thin films as plasmonic materials by high-power impulse magnetron sputtering |
作者: | Yang, Zih-Ying Chen, Yi-Hsun Liao, Bo-Huei Chen, Kuo-Ping 照明與能源光電研究所 影像與生醫光電研究所 Institute of Lighting and Energy Photonics Institute of Imaging and Biomedical Photonics |
公開日期: | 1-二月-2016 |
摘要: | High-power impulse magnetron sputtering (HiPIMS) was used to deposit titanium nitride (TiN) thin films with high electron density as alternative plasmonic materials. TiN thin films with thicknesses of 20-40 nm were deposited with different average sputtering powers, and exhibited metallic-and dielectric-like optical properties. When the sputtering power was increased from 80 W to 300 W, denser polycrystalline TiN thin films were obtained at room temperature (RT) with a conductivity 25 times that of the low-sputtering-power film. With sufficient average power (>= 180 W), the films exhibited metallic-like optical properties, and a conductivity of >10(5) S/m. By using HiPIMS deposition, good-quality metallic-like TiN thin films could be fabricated at RT without heating the substrate. (C) 2016 Optical Society of America |
URI: | http://dx.doi.org/10.1364/OME.6.000540 http://hdl.handle.net/11536/133538 |
ISSN: | 2159-3930 |
DOI: | 10.1364/OME.6.000540 |
期刊: | OPTICAL MATERIALS EXPRESS |
Volume: | 6 |
Issue: | 2 |
起始頁: | 540 |
結束頁: | 551 |
顯示於類別: | 期刊論文 |