標題: Room temperature fabrication of titanium nitride thin films as plasmonic materials by high-power impulse magnetron sputtering
作者: Yang, Zih-Ying
Chen, Yi-Hsun
Liao, Bo-Huei
Chen, Kuo-Ping
照明與能源光電研究所
影像與生醫光電研究所
Institute of Lighting and Energy Photonics
Institute of Imaging and Biomedical Photonics
公開日期: 1-二月-2016
摘要: High-power impulse magnetron sputtering (HiPIMS) was used to deposit titanium nitride (TiN) thin films with high electron density as alternative plasmonic materials. TiN thin films with thicknesses of 20-40 nm were deposited with different average sputtering powers, and exhibited metallic-and dielectric-like optical properties. When the sputtering power was increased from 80 W to 300 W, denser polycrystalline TiN thin films were obtained at room temperature (RT) with a conductivity 25 times that of the low-sputtering-power film. With sufficient average power (>= 180 W), the films exhibited metallic-like optical properties, and a conductivity of >10(5) S/m. By using HiPIMS deposition, good-quality metallic-like TiN thin films could be fabricated at RT without heating the substrate. (C) 2016 Optical Society of America
URI: http://dx.doi.org/10.1364/OME.6.000540
http://hdl.handle.net/11536/133538
ISSN: 2159-3930
DOI: 10.1364/OME.6.000540
期刊: OPTICAL MATERIALS EXPRESS
Volume: 6
Issue: 2
起始頁: 540
結束頁: 551
顯示於類別:期刊論文


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