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dc.contributor.authorLin, Wei-Haoen_US
dc.contributor.authorChen, Chun-Yien_US
dc.contributor.authorChang, Tso-Fu Marken_US
dc.contributor.authorHsu, Yung-Jungen_US
dc.contributor.authorSone, Masatoen_US
dc.date.accessioned2017-04-21T06:55:53Z-
dc.date.available2017-04-21T06:55:53Z-
dc.date.issued2016-08-01en_US
dc.identifier.issn0013-4686en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.electacta.2016.04.088en_US
dc.identifier.urihttp://hdl.handle.net/11536/133712-
dc.description.abstractThis study reports the effect of the high pressure on properties, especially the crystallinity, of the TiO2 and SnO2 films cathodically deposited in supercritical CO2 emulsified electrolyte. The as-deposited metal oxides are usually amorphous when cathodic deposition is applied. An additional heat treatment process is needed to have crystalline metal oxides. In this study, the TiO2 and SnO2 thin films cathodically deposited at elevated pressure showed an improvement in the crystallinity with an increase in the pressure using X-ray diffraction analysis. The high-resolution transmission electron microscopy and selected-area electron diffraction confirmed that the TiO2 deposited at 35 MPa had the anatase crystal structure. An enhancement in the charge carrier dynamics at the TiO2 electrode/electrolyte interface with an increase in the pressure was observed from the electrochemical impedance spectroscopy, which is a result of the improved crystallinity. The effect of the pressure on the crystallinity of the SnO2 was more obvious than that on the TiO2. Grain size of the SnO2 films estimated by the Scherrer equation was increased from 3.5 to 14.8 nm when the pressure was increased from 5 to 25 MPa. (C) 2016 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcathodic depositionen_US
dc.subjecttitanium dioxidesen_US
dc.subjecttin dioxidesen_US
dc.subjecthigh pressureen_US
dc.subjectcrystallinityen_US
dc.titleEffects of Pressure in Cathodic Deposition of TiO2 and SnO2 with Supercritical CO2 Emulsified Electrolyteen_US
dc.identifier.doi10.1016/j.electacta.2016.04.088en_US
dc.identifier.journalELECTROCHIMICA ACTAen_US
dc.citation.volume208en_US
dc.citation.spage244en_US
dc.citation.epage250en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000377545300030en_US
Appears in Collections:Articles