完整後設資料紀錄
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dc.contributor.authorLi, Hengen_US
dc.contributor.authorShi, Yang-Daen_US
dc.contributor.authorFeng, Meixinen_US
dc.contributor.authorSun, Qianen_US
dc.contributor.authorLu, Tien-Changen_US
dc.date.accessioned2017-04-21T06:55:18Z-
dc.date.available2017-04-21T06:55:18Z-
dc.date.issued2016-04en_US
dc.identifier.issn1882-0778en_US
dc.identifier.urihttp://dx.doi.org/10.7567/APEX.9.042101en_US
dc.identifier.urihttp://hdl.handle.net/11536/133818-
dc.description.abstractWe investigated the effect of device thickness on the internal quantum efficiency (IQE) of thin-film GaN light-emitting diodes (LEDs), which were grown on Si substrates and transferred to other Si substrates with reduced film thickness. It was confirmed by Raman spectroscopy and photoluminescence measurement that the compressive strain is released and the quantum-confined Stark effect (QCSE) is suppressed after reducing the thickness. The best IQE of 62.9% was reached with a large suppression of the band tilting by QCSE, from 7.9meV in the original structure to 2.4meV in the thinnest sample, and this value can compete with that of GaN-based LEDs grown on a sapphire substrate. (C) 2016 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleEffects of thickness on optical characteristics and strain distribution of thin-film GaN light-emitting diodes transferred to Si substratesen_US
dc.identifier.doi10.7567/APEX.9.042101en_US
dc.identifier.journalAPPLIED PHYSICS EXPRESSen_US
dc.citation.volume9en_US
dc.citation.issue4en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000375661600007en_US
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