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dc.contributor.authorTai, Ya-Hsiangen_US
dc.contributor.authorChang, Chun-Yien_US
dc.contributor.authorHsieh, Chung-Lunen_US
dc.date.accessioned2017-04-21T06:56:35Z-
dc.date.available2017-04-21T06:56:35Z-
dc.date.issued2016-07en_US
dc.identifier.issn1551-319Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JDT.2016.2519045en_US
dc.identifier.urihttp://hdl.handle.net/11536/133900-
dc.description.abstractIn this paper, we investigate the response of low-frequency noise to the light for the amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFTs). Compared with the case of nonillumination, the noise level increases with the light intensity. We find that the induced noise is more related to the drain current (I-D) with or without illumination, even though the corresponding gate voltage can be different. With fixed light intensity, the noise induced at the same I-D keeps the same regardless of the illumination history. The noise mechanism is analyzed to be mainly the carrier mobility fluctuation, but carrier number fluctuation becomes important under illumination. We speculate that oxygen vacancies generated by light affect the trapping and releasing of carrier. It thus leads to the noise increasing with illumination.en_US
dc.language.isoen_USen_US
dc.subjectAmorphous indium gallium zinc oxide (a-IGZO)en_US
dc.subjectillumination stressen_US
dc.subjectlow frequency noise (LFN)en_US
dc.subjectthin film transistors (TFTs)en_US
dc.titleEffects of Illumination on the Noise Behavior of Amorphous Indium Gallium Zinc Oxide Thin Film Transistorsen_US
dc.identifier.doi10.1109/JDT.2016.2519045en_US
dc.identifier.journalJOURNAL OF DISPLAY TECHNOLOGYen_US
dc.citation.volume12en_US
dc.citation.issue7en_US
dc.citation.spage685en_US
dc.citation.epage689en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000378261900004en_US
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