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dc.contributor.authorLin, Shih-Yangen_US
dc.contributor.authorChang, Shen-Linen_US
dc.contributor.authorChen, Hsin-Hsienen_US
dc.contributor.authorSu, Shu-Hsuanen_US
dc.contributor.authorHuang, Jung-Chunen_US
dc.contributor.authorLin, Ming-Faen_US
dc.date.accessioned2017-04-21T06:56:16Z-
dc.date.available2017-04-21T06:56:16Z-
dc.date.issued2016-07-28en_US
dc.identifier.issn1463-9076en_US
dc.identifier.urihttp://dx.doi.org/10.1039/c6cp03406cen_US
dc.identifier.urihttp://hdl.handle.net/11536/134017-
dc.description.abstractThe geometric and electronic properties of Bi-adsorbed monolayer graphene, enriched by the strong effect of a substrate, are investigated by first-principles calculations. The six-layered substrate, corrugated buffer layer, and slightly deformed monolayer graphene are all simulated. Adatom arrangements are thoroughly studied by analyzing the ground-state energies, bismuth adsorption energies, and Bi-Bi interaction energies of different adatom heights, inter-adatom distance, adsorption sites, and hexagonal positions. A hexagonal array of Bi atoms is dominated by the interactions between the buffer layer and the monolayer graphene. An increase in temperature can overcome a similar to 50 meV energy barrier and induce triangular and rectangular nanoclusters. The most stable and metastable structures agree with the scanning tunneling microscopy measurements. The density of states exhibits a finite value at the Fermi level, a dip at similar to -0.2 eV, and a peak at similar to-0.6 eV, as observed in the experimental measurements of the tunneling conductance.en_US
dc.language.isoen_USen_US
dc.titleSubstrate-induced structures of bismuth adsorption on graphene: a first principles studyen_US
dc.identifier.doi10.1039/c6cp03406cen_US
dc.identifier.journalPHYSICAL CHEMISTRY CHEMICAL PHYSICSen_US
dc.citation.volume18en_US
dc.citation.issue28en_US
dc.citation.spage18978en_US
dc.citation.epage18984en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000379939100036en_US
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