完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Lee, SH | en_US |
dc.contributor.author | Wu, CY | en_US |
dc.contributor.author | Yang, SK | en_US |
dc.contributor.author | Lee, YP | en_US |
dc.date.accessioned | 2014-12-08T15:18:38Z | - |
dc.date.available | 2014-12-08T15:18:38Z | - |
dc.date.issued | 2005-08-15 | en_US |
dc.identifier.issn | 0021-9606 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.2006093 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/13402 | - |
dc.description.abstract | Following photodissociation of formyl fluoride (HFCO) at 193 nm, we detected products with fragmentation translational spectroscopy utilizing a tunable vacuum ultraviolet beam from a synchrotron for ionization. Among three primary dissociation channels observed in this work, the F-elimination channel HFCO -> HCO+F dominates, with a branching ratio similar to 0.66 and an average release of kinetic energy similar to 55 kJ mol(-1); about 17% of HCO further decomposes to H+CO. The H-elimination channel HFCO -> FCO+H has a branching ratio similar to 0.28 and an average release of kinetic energy similar to 99 kJ mol(-1); about 21% of FCO further decomposes to F+CO. The F-elimination channel likely proceeds via the S-1 surface whereas the H-elimination channel proceeds via the T-1 surface; both channels exhibit moderate barriers for dissociation. The molecular HF-elimination channel HFCO -> HF+CO, correlating with the ground electronic surface, has a branching ratio of only similar to 0.06; the average translational release of 93 kJ mol(-1), similar to 15% of available energy, implies that the fragments are highly internally excited. Detailed mechanisms of photodissociation are discussed. (c) 2005 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Photodissociation dynamics of formyl fluoride (HFCO) at 193 nm: Branching ratios and distributions of kinetic energy | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.2006093 | en_US |
dc.identifier.journal | JOURNAL OF CHEMICAL PHYSICS | en_US |
dc.citation.volume | 123 | en_US |
dc.citation.issue | 7 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 應用化學系 | zh_TW |
dc.contributor.department | 應用化學系分子科學碩博班 | zh_TW |
dc.contributor.department | Department of Applied Chemistry | en_US |
dc.contributor.department | Institute of Molecular science | en_US |
dc.identifier.wosnumber | WOS:000231449700037 | - |
dc.citation.woscount | 10 | - |
顯示於類別: | 期刊論文 |