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dc.contributor.authorLee, SHen_US
dc.contributor.authorWu, CYen_US
dc.contributor.authorYang, SKen_US
dc.contributor.authorLee, YPen_US
dc.date.accessioned2014-12-08T15:18:38Z-
dc.date.available2014-12-08T15:18:38Z-
dc.date.issued2005-08-15en_US
dc.identifier.issn0021-9606en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2006093en_US
dc.identifier.urihttp://hdl.handle.net/11536/13402-
dc.description.abstractFollowing photodissociation of formyl fluoride (HFCO) at 193 nm, we detected products with fragmentation translational spectroscopy utilizing a tunable vacuum ultraviolet beam from a synchrotron for ionization. Among three primary dissociation channels observed in this work, the F-elimination channel HFCO -> HCO+F dominates, with a branching ratio similar to 0.66 and an average release of kinetic energy similar to 55 kJ mol(-1); about 17% of HCO further decomposes to H+CO. The H-elimination channel HFCO -> FCO+H has a branching ratio similar to 0.28 and an average release of kinetic energy similar to 99 kJ mol(-1); about 21% of FCO further decomposes to F+CO. The F-elimination channel likely proceeds via the S-1 surface whereas the H-elimination channel proceeds via the T-1 surface; both channels exhibit moderate barriers for dissociation. The molecular HF-elimination channel HFCO -> HF+CO, correlating with the ground electronic surface, has a branching ratio of only similar to 0.06; the average translational release of 93 kJ mol(-1), similar to 15% of available energy, implies that the fragments are highly internally excited. Detailed mechanisms of photodissociation are discussed. (c) 2005 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titlePhotodissociation dynamics of formyl fluoride (HFCO) at 193 nm: Branching ratios and distributions of kinetic energyen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2006093en_US
dc.identifier.journalJOURNAL OF CHEMICAL PHYSICSen_US
dc.citation.volume123en_US
dc.citation.issue7en_US
dc.citation.epageen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000231449700037-
dc.citation.woscount10-
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