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dc.contributor.authorChen, Hua-Maoen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLiao, Po-Yungen_US
dc.contributor.authorChiang, Hsiao-Chengen_US
dc.contributor.authorChen, Ching-Enen_US
dc.contributor.authorChen, Bo-Weien_US
dc.contributor.authorPan, Chih-Hungen_US
dc.contributor.authorHung, Yu-Juen_US
dc.date.accessioned2017-04-21T06:48:50Z-
dc.date.available2017-04-21T06:48:50Z-
dc.date.issued2016en_US
dc.identifier.isbn978-1-5090-1493-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/134643-
dc.description.abstractThis work studies the mechanism of identical photoinduced leakage current in a-InGaZnO4 thin film transistors during reverse gate voltage sweep. There is the identical off-state current with the reverse sweep under UV light irradiation, and the photocurrent for UV light exposure region near the source electrode is more significant than that near the drain electrode, which is different from photocurrent mechanism of low temperature polysilicon TFTs. This is because the photo-generated electrons increase the carrier concentration in a-InGaZnO4 bulk, causing the reduced depletion width of the active layer. Therefore, the back channel of active layer is out of gate control.en_US
dc.language.isoen_USen_US
dc.subjectUV lighten_US
dc.subjectIGZOen_US
dc.subjectdepletion lengthen_US
dc.subjectphoto currenten_US
dc.titleIdentical Off-state Current Raise Induced by Photo-induced Schottky Barrier Lowering in a-InGaZnO4 Thin Film Transistorsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2016 IEEE 16TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)en_US
dc.citation.spage783en_US
dc.citation.epage786en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000391840000222en_US
dc.citation.woscount0en_US
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