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dc.contributor.authorChiang, Che-Yangen_US
dc.contributor.authorHsu, Heng-Tungen_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2019-04-03T06:47:53Z-
dc.date.available2019-04-03T06:47:53Z-
dc.date.issued2012-01-01en_US
dc.identifier.issn1875-3892en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.phpro.2012.03.054en_US
dc.identifier.urihttp://hdl.handle.net/11536/134759-
dc.description.abstractThis paper examines the effect of the field plate structure on the RF performance of AlGaN/GaN High Electron Mobility Transistor (HEMT) devices. While the field plate structure helps to increase the breakdown voltage of the device through modulating the electric field locally, it induces additional feedback capacitance from drain to gate. Such feedback capacitors may impact the overall RF performance of the device especially at high frequencies. Systematic investigations on the small signal as well as power performance as functions of the drain biases are presented. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Garry Leeen_US
dc.language.isoen_USen_US
dc.subjectfield plateen_US
dc.subjectAlGaN/GaNen_US
dc.subjectHEMTen_US
dc.subjectfeedbacken_US
dc.subjectcapacitorsen_US
dc.titleEffect of Field Plate on the RF Performance of AlGaN/GaN HEMT Devicesen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1016/j.phpro.2012.03.054en_US
dc.identifier.journalINTERNATIONAL CONFERENCE ON SOLID STATE DEVICES AND MATERIALS SCIENCEen_US
dc.citation.volume25en_US
dc.citation.spage86en_US
dc.citation.epage91en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000305960300014en_US
dc.citation.woscount9en_US
Appears in Collections:Conferences Paper


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