The Effect of X-ray Irradiation on the Novella Type Photoresist

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	You, Hsin-Chiang	en_US
dc.contributor.author	Shieh, Shao-Hui	en_US
dc.contributor.author	Zhang, Shiang-Jun	en_US
dc.contributor.author	Ko, Fu-Hsiang	en_US
dc.contributor.author	Lin, Hsiung-Min	en_US
dc.contributor.author	Tsaur, Shyh-Chang	en_US
dc.contributor.author	Lin, Chin-Che	en_US
dc.date.accessioned	2017-04-21T06:49:52Z	-
dc.date.available	2017-04-21T06:49:52Z	-
dc.date.issued	2010	en_US
dc.identifier.isbn	978-1-4244-3543-2	en_US
dc.identifier.uri	http://hdl.handle.net/11536/134877	-
dc.language.iso	en_US	en_US
dc.title	The Effect of X-ray Irradiation on the Novella Type Photoresist	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2	en_US
dc.citation.spage	1063	en_US
dc.citation.epage	1063	en_US
dc.contributor.department	材料科學與工程學系奈米科技碩博班	zh_TW
dc.contributor.department	Graduate Program of Nanotechnology , Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:000282026500542	en_US
dc.citation.woscount	0	en_US
顯示於類別：	會議論文