統計資料
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| Formation of dual-phase HfO2-HfxSi1-xO2 dielectric and its application in memory devices | 111 |
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| 000231062200046.pdf | 17 |
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| 檢視 | |
|---|---|
| Formation of dual-phase HfO2-HfxSi1-xO2 dielectric and its application in memory devices | 111 |
| 檢視 | |
|---|---|
| 000231062200046.pdf | 17 |
| 檢視 | |
|---|---|
| 中國 | 98 |
| 美國 | 13 |
| 檢視 | |
|---|---|
| Shenzhen | 97 |
| Menlo Park | 10 |
| Kensington | 3 |
| Zhengzhou | 1 |