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dc.contributor.authorHsu, Heng-Tungen_US
dc.contributor.authorChang, Chia-Yuanen_US
dc.contributor.authorChang, Edward Yien_US
dc.contributor.authorKu, Chien-, Ien_US
dc.contributor.authorMiyamoto, Yasuyukien_US
dc.date.accessioned2017-04-21T06:49:11Z-
dc.date.available2017-04-21T06:49:11Z-
dc.date.issued2007en_US
dc.identifier.isbn978-1-4244-0748-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/135118-
dc.description.abstractAn 80-nm InP HEMT with InAs channel and InGaAs sub-channels has been fabricated. The high current gain cutoff frequency (ft) of 350 GHz and maximum oscillation frequency (fmax) of 360 GRz were obtained at VDS = 0.7 V due to the high electron mobility in the InAs channel. DC and RF characterizations on the device have been performed and the on-sate breakdown voltage of the device was measured to be 1.75V. A 2-stage MMIC gain block was designed using such device. A simulated gain of better than 12 dB from 54 GHz to 71 GRz with only 14mW DC power consumption was achieved. Such high performance HEMTs demonstrated in this study shows great potential for very low power millimeter wave applications.en_US
dc.language.isoen_USen_US
dc.subjectInP HEMTen_US
dc.subjectInGaAsen_US
dc.subjectgain blocken_US
dc.subjectAEMCen_US
dc.titleHigh Perfonnance InAs-Channel HEMT for Low Voltage Milimeter Waive Applicationsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2007 ASIA PACIFIC MICROWAVE CONFERENCE, VOLS 1-5en_US
dc.citation.spage1286en_US
dc.citation.epage+en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000261353300328en_US
dc.citation.woscount0en_US
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