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dc.contributor.authorLee, Yih-Shingen_US
dc.contributor.authorFan, Sheng-Kaien_US
dc.contributor.authorChen, Chii-Wenen_US
dc.contributor.authorYen, Tung-Weien_US
dc.contributor.authorLin, Horng-Chihen_US
dc.date.accessioned2017-04-21T06:50:19Z-
dc.date.available2017-04-21T06:50:19Z-
dc.date.issued2013en_US
dc.identifier.isbn978-1-4799-0464-8en_US
dc.identifier.urihttp://hdl.handle.net/11536/135361-
dc.description.abstractIn this paper, the temperature dependence of electrical behavior on amorphous In-Ga-Zn-O (a-IGZO) thin film transistors (TFTs) having plasma-enhanced chemical vapor deposition (PECVD) tetraethylorthosilicate (TEOS) oxide as the dielectric material was evaluated. Sub-threshold swing (SS) increases and Vth is negatively shifted as the temperature rises. Temperature-dependent sub-threshold characteristics were also observed for the fabricated a-IGZO TFTs. The increase in subthreshold current in a-IGZO TFTs is well described by the thermally activated electrons.en_US
dc.language.isoen_USen_US
dc.subjectcomponenten_US
dc.subjectIn-Ga-Zn-Oen_US
dc.subjectPECVD TEOSen_US
dc.subjectsub-threshold swingen_US
dc.subjecttemperature Instabilityen_US
dc.subjectthermal activation energyen_US
dc.titleTemperature Instability of Amorphous In-Ga-Zn-O Thin Film Transistorsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2013 IEEE 6TH INTERNATIONAL CONFERENCE ON ADVANCED INFOCOMM TECHNOLOGY (ICAIT)en_US
dc.citation.spage153en_US
dc.citation.epage+en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000342413300070en_US
dc.citation.woscount0en_US
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