完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lee, Yih-Shing | en_US |
dc.contributor.author | Fan, Sheng-Kai | en_US |
dc.contributor.author | Chen, Chii-Wen | en_US |
dc.contributor.author | Yen, Tung-Wei | en_US |
dc.contributor.author | Lin, Horng-Chih | en_US |
dc.date.accessioned | 2017-04-21T06:50:19Z | - |
dc.date.available | 2017-04-21T06:50:19Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.isbn | 978-1-4799-0464-8 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/135361 | - |
dc.description.abstract | In this paper, the temperature dependence of electrical behavior on amorphous In-Ga-Zn-O (a-IGZO) thin film transistors (TFTs) having plasma-enhanced chemical vapor deposition (PECVD) tetraethylorthosilicate (TEOS) oxide as the dielectric material was evaluated. Sub-threshold swing (SS) increases and Vth is negatively shifted as the temperature rises. Temperature-dependent sub-threshold characteristics were also observed for the fabricated a-IGZO TFTs. The increase in subthreshold current in a-IGZO TFTs is well described by the thermally activated electrons. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | component | en_US |
dc.subject | In-Ga-Zn-O | en_US |
dc.subject | PECVD TEOS | en_US |
dc.subject | sub-threshold swing | en_US |
dc.subject | temperature Instability | en_US |
dc.subject | thermal activation energy | en_US |
dc.title | Temperature Instability of Amorphous In-Ga-Zn-O Thin Film Transistors | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2013 IEEE 6TH INTERNATIONAL CONFERENCE ON ADVANCED INFOCOMM TECHNOLOGY (ICAIT) | en_US |
dc.citation.spage | 153 | en_US |
dc.citation.epage | + | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000342413300070 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 會議論文 |