All-Color Plasmonic Nanolasers with Ultralow Thresholds

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Lu, Yu-Jung	en_US
dc.contributor.author	Kim, Jisun	en_US
dc.contributor.author	Chen, Hung-Ying	en_US
dc.contributor.author	Chang, Wen-Hao	en_US
dc.contributor.author	Shih, Chih-Kang	en_US
dc.contributor.author	Gwo, Shangjr	en_US
dc.date.accessioned	2017-04-21T06:50:03Z	-
dc.date.available	2017-04-21T06:50:03Z	-
dc.date.issued	2013	en_US
dc.identifier.isbn	978-1-4673-6476-8	en_US
dc.identifier.uri	http://hdl.handle.net/11536/135376	-
dc.description.abstract	Diffraction-unlimited semiconductor nanolasers are demonstrated by using single shape-controlled InGaN/GaN core-shell nanorods as laser gain media on Ag films epitaxially grown on Si substrates. The use of atomically smooth Ag films allows us to fabricate low-loss plasmonic cavities for ultralow-threshold, continuous-wave (CW) nanolaser operation above liquid nitrogen temperature. Furthermore, the tunable band-gap energy of the InxGa1-xN alloy makes it possible to realize laser emission in the full visible spectrum.	en_US
dc.language.iso	en_US	en_US
dc.title	All-Color Plasmonic Nanolasers with Ultralow Thresholds	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR)	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000334176100229	en_US
dc.citation.woscount	0	en_US
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