完整後設資料紀錄
DC 欄位語言
dc.contributor.authorHo, Ching-Yuanen_US
dc.contributor.authorTu, Tse-Yien_US
dc.contributor.authorWang, Chun-Chiehen_US
dc.contributor.authorKang, Yuanen_US
dc.date.accessioned2017-04-21T06:49:51Z-
dc.date.available2017-04-21T06:49:51Z-
dc.date.issued2011en_US
dc.identifier.isbn978-1-61804-005-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/135506-
dc.description.abstractThe nanostructure transformation associated with electro-optical properties via post-annealing of indium tin oxide film (ITO) is investigated by increasing post-annealing temperature in ambient oxygen. Although oxygen vacancy and activation Sn ions contribute to conductivity of ITO film, the oxygen vacancy inevitably reduces during posting annealing, but Sn-O related bonds are oppositely increased with IR absorption at 790 cm(-1). Moreover, the sheet resistance of as-deposited ITO film 8.6 Omega/sq increases to 47 Omega/sq as the annealing temperature rises to 500 degrees C., the photoluminescence (PL) spectrum indicates that the oxygen vacancy plays a key role in dominating R-s in comparison with Sn-O bonds. The blue light transmittance of ITO film is slightly proportional to the annealing temperature due to phase crystallization enhancing band gap narrowing. Furthermore, as the annealing temperature rises beyond 500 degrees C, the transmittance is compromised between the Burstein-Moss effect of high carrier concentration and nanostructure crystallinity. The oxygen deficient vacancy, instead of Sn-O related bonds, is a major contribution for ITO conductivity and transmittanceen_US
dc.language.isoen_USen_US
dc.subjectPost-annealingen_US
dc.subjectindium tin oxide film (ITO)en_US
dc.subjectoxygen vacancyen_US
dc.subjectBurstein-Moss effecten_US
dc.subjectoxygen vacancyen_US
dc.subjectphotoluminescenceen_US
dc.titleInvestigation of post-annealing indium tin oxide for future electro-optical device applicationen_US
dc.typeProceedings Paperen_US
dc.identifier.journalRECENT RESEARCHES IN TELECOMMUNICATIONS, INFORMATICS, ELECTRONICS & SIGNAL PROCESSINGen_US
dc.citation.spage154en_US
dc.citation.epage+en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:000303790700029en_US
dc.citation.woscount0en_US
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