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dc.contributor.authorChen, Hsiangen_US
dc.contributor.authorLu, Tien-Changen_US
dc.date.accessioned2017-04-21T06:48:35Z-
dc.date.available2017-04-21T06:48:35Z-
dc.date.issued2010en_US
dc.identifier.isbn978-1-60768-156-4en_US
dc.identifier.issn1938-5862en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3360625en_US
dc.identifier.urihttp://hdl.handle.net/11536/135567-
dc.description.abstractThe reverse-bias operation of the InGaN LED device can shed a light on device reliability problems. Our goal is to use noninvasive optical characterization techniques including surface temperature measurements, 2D XRF( X-ray fluorescent) element analysis, and 2D electroluminescence measurements to visualize the leakage current distribution and examine the origin of the reverse-bias leakage current. The origin of the reverse-bias emission is attributed to imperfect metal contact caused by process variation. Hot electron induced emission due to the leakage current should be the mechanism of the reverse-bias emission from the surface defect and the imperfect contact. The light emission was proved to be relevant to reliability problems in terms of the leakage current.en_US
dc.language.isoen_USen_US
dc.titleReverse-bias Electroluminescence Observation for Reliability Investigations of the InGaN LEDen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1149/1.3360625en_US
dc.identifier.journalCHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010)en_US
dc.citation.volume27en_US
dc.citation.issue1en_US
dc.citation.spage237en_US
dc.citation.epage242en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000313327800039en_US
dc.citation.woscount0en_US
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