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dc.contributor.authorHuang, Shen-Cheen_US
dc.contributor.authorHong, Kuo-Binen_US
dc.contributor.authorLi, Hengen_US
dc.contributor.authorLu, Tien-Changen_US
dc.date.accessioned2017-04-21T06:49:27Z-
dc.date.available2017-04-21T06:49:27Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-4799-8379-7en_US
dc.identifier.issn2158-3234en_US
dc.identifier.urihttp://hdl.handle.net/11536/135781-
dc.description.abstractMetallic subwavelength gratings as limit-element linear array can provide the great improving output performance of optical light emitter. We investigated that the device with metallic subwavelength grating can be used to modulate the beam of edge-emitting laser with a patterned facet. Utilizing GaN-based semiconductor laser as a model system, the defined metallic subwavelength slits and gratings is a type of superior reduction method of beam divergence and coupling into other optical components effectively. We believe this study will be helpful for development of the novel light emitting devices in the blue or UV region.en_US
dc.language.isoen_USen_US
dc.titleMetallic subwavelength grating on GaN-based edge emitting lasersen_US
dc.typeProceedings Paperen_US
dc.identifier.journal15TH INTERNATIONAL CONFERENCE ON NUMERICAL SIMULATION OF OPTOELECTRONIC DEVICES NUSOD 2015en_US
dc.citation.spage135en_US
dc.citation.epage136en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000380401200066en_US
dc.citation.woscount0en_US
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