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dc.contributor.authorHuang, Jen-Hungen_US
dc.contributor.authorChen, Bai-Cien_US
dc.contributor.authorWu, Yu-Changen_US
dc.contributor.authorLin, Chien-Chungen_US
dc.date.accessioned2017-04-21T06:49:27Z-
dc.date.available2017-04-21T06:49:27Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-4799-8379-7en_US
dc.identifier.issn2158-3234en_US
dc.identifier.urihttp://hdl.handle.net/11536/135782-
dc.description.abstractWe propose and numerically analyze a novel sub-wavelength grating for the purpose of III-V/silicon integration. The design is based on different shapes of gratings in order to increase the lateral (or sideway) coupling. By using COMSOL (R) as the platform, the reverse V-grating design can have doubled percentage of optical field into the silicon grating region when compared to reference. However, the threshold gain of this design is still high and further optimization is needed.en_US
dc.language.isoen_USen_US
dc.titleNumerical Analysis on V-shape Gratings for III-V/Silicon Hybrid Lasersen_US
dc.typeProceedings Paperen_US
dc.identifier.journal15TH INTERNATIONAL CONFERENCE ON NUMERICAL SIMULATION OF OPTOELECTRONIC DEVICES NUSOD 2015en_US
dc.citation.spage137en_US
dc.citation.epage138en_US
dc.contributor.department光電系統研究所zh_TW
dc.contributor.department影像與生醫光電研究所zh_TW
dc.contributor.departmentInstitute of Photonic Systemen_US
dc.contributor.departmentInstitute of Imaging and Biomedical Photonicsen_US
dc.identifier.wosnumberWOS:000380401200067en_US
dc.citation.woscount0en_US
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