Full metadata record
DC FieldValueLanguage
dc.contributor.authorKuo, Ming-Haoen_US
dc.contributor.authorChen, Ho-Chaneen_US
dc.contributor.authorLai, Wei-Tingen_US
dc.contributor.authorLi, Pei-Wenen_US
dc.date.accessioned2017-04-21T06:49:45Z-
dc.date.available2017-04-21T06:49:45Z-
dc.date.issued2015en_US
dc.identifier.isbn978-1-4673-7604-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/135838-
dc.description.abstractWe demonstrated a novel CMOS approach for the fabrication of high-performance Ge quantum dot (QD) MOSFETs offering great promises as optical switches and transducers for Si-based optical interconnects. Measured photocurrent to dark current ratio (I-ph/I-dark) and photoresponsivities from the Ge QD PT were as high as 272,000 and 1.7 A/W, respectively, under incident power of 20 W at 980 nm illumination. Carrier dynamics in Ge QDs were characterized by applying a depleting voltage pulse to the gate of MOSFET and by time-resolved photoluminescence on Ge QD array.en_US
dc.language.isoen_USen_US
dc.titleCharacterization of carrier dynamics in Ge quantum dots through Ge quantum-dot MOSFETs using pulsed voltage techniqueen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2015 SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000380461900025en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper