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dc.contributor.authorHuang, Shen-Cheen_US
dc.contributor.authorHong, Kuo-Binen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorHe, Sailingen_US
dc.date.accessioned2019-04-03T06:48:00Z-
dc.date.available2019-04-03T06:48:00Z-
dc.date.issued2016-01-01en_US
dc.identifier.isbn978-1-62841-992-4en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.2212390en_US
dc.identifier.urihttp://hdl.handle.net/11536/135900-
dc.description.abstractWe designed and fabricated a two dimensional high contrast subwavelength grating (HCG) mirrors. The computer-aided software was employed to verify the structural parameters including grating periods and filling factors. From the optimized simulation results, the designed HCG structure has a wide reflection stopband (reflectivity (R) >90%) of over 200 nm, which centered at telecommunication wavelength. The optimized HCG mirrors were fabricated by electron-beam lithography and inductively coupled plasma process technique. The experimental result was almost consistent with calculated data. This achievement should have an impact on numerous photonic devices helpful attribution to the integrated HCG VCSELs in the future.en_US
dc.language.isoen_USen_US
dc.subjectsubwavelength gratingen_US
dc.subjectHCGen_US
dc.subjectsilicon-on-insulatoren_US
dc.titleTwo-dimensional designed fabrication of subwavelength grating HCG mirror on Silicon-on-insulatoren_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.2212390en_US
dc.identifier.journalHIGH CONTRAST METASTRUCTURES Ven_US
dc.citation.volume9757en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000381698900005en_US
dc.citation.woscount0en_US
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