完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Zheng, Zhi-Wei | en_US |
dc.contributor.author | Cheng, Chun-Hu | en_US |
dc.contributor.author | Chou, Kun-I | en_US |
dc.contributor.author | Liu, Ming | en_US |
dc.contributor.author | Chin, Albert | en_US |
dc.date.accessioned | 2017-04-21T06:49:59Z | - |
dc.date.available | 2017-04-21T06:49:59Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.isbn | 978-1-4673-2523-3 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/136164 | - |
dc.description.abstract | High uniform current distribution, good endurance, and low 28 mu W switching power are successfully achieved in Ni/GeOx/TiOy/TaN resistive random access memory devices on flexible polyimide substrate. The good performances are attributed to the nitrogen-rich TaN to increase the oxidation resistance and decrease the TaON and oxygen vacancies formation from x-ray photoelectron spectroscopy measurements, where such oxygen vacancies are related to current conduction at high resistance state. The present results demonstrate that the device with nitrogen-rich TaN electrode has a strong potential for future low-cost high-performance flexible memory application. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | resistive memory | en_US |
dc.subject | flexible | en_US |
dc.subject | nitrogen-rich TaN | en_US |
dc.title | Current Uniformity Improvement in Flexible Resistive Memory | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2013 IEEE INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC) | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000380585600163 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 會議論文 |