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dc.contributor.authorZheng, Zhi-Weien_US
dc.contributor.authorCheng, Chun-Huen_US
dc.contributor.authorChou, Kun-Ien_US
dc.contributor.authorLiu, Mingen_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2017-04-21T06:49:59Z-
dc.date.available2017-04-21T06:49:59Z-
dc.date.issued2013en_US
dc.identifier.isbn978-1-4673-2523-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/136164-
dc.description.abstractHigh uniform current distribution, good endurance, and low 28 mu W switching power are successfully achieved in Ni/GeOx/TiOy/TaN resistive random access memory devices on flexible polyimide substrate. The good performances are attributed to the nitrogen-rich TaN to increase the oxidation resistance and decrease the TaON and oxygen vacancies formation from x-ray photoelectron spectroscopy measurements, where such oxygen vacancies are related to current conduction at high resistance state. The present results demonstrate that the device with nitrogen-rich TaN electrode has a strong potential for future low-cost high-performance flexible memory application.en_US
dc.language.isoen_USen_US
dc.subjectresistive memoryen_US
dc.subjectflexibleen_US
dc.subjectnitrogen-rich TaNen_US
dc.titleCurrent Uniformity Improvement in Flexible Resistive Memoryen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2013 IEEE INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000380585600163en_US
dc.citation.woscount0en_US
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